The server is under maintenance between 08:00 to 12:00 (GMT+08:00), and please visit later.
We apologize for any inconvenience caused
Login  | Sign Up  |  Oriprobe Inc. Feed
China/Asia On Demand
Journal Articles
Laws/Policies/Regulations
Companies/Products
Bookmark and Share
wei dian zi jing pian de xiao hua guo cheng wei miao de jian kang wei hai
Author(s): 
Pages: 34
Year: Issue:  1
Journal: Occupation and Health

Keyword:  健康危害等离子体氮化硅氮化物晶片微电子工业沉积物呼吸性粉尘潜在性挥发性;
Abstract: <正> 在微电子工业中,硝化是使SiN4(氮化硅)沉积在晶片表面上的一种方法,只要存在着允许沉积的低压条件,SiF4就会与NH3发生反应。对于沉积在晶片上和房壁上的黄色氮化物粉尘应定期清扫。据认为,沉积物与CF4等离子体形成了一个清除挥发性的
Related Articles
No related articles found