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fan ying li zi shu ke shi jin zhan gai kuang bao dao
Author(s): 
Pages: 85-86
Year: Issue:  4
Journal: Optoelectronic Technology

Keyword:  离子束刻蚀淀积反应形式束源等离子体刻蚀离子铣工作过程进展概况圆片热控制;
Abstract: <正> 利用校准的离子束源来提供反应形式离子,由于在源内部淀积而很快使工作过程不能继续下去。它限于一或二次工作,至多连续工作几小时。已报导了相当大的刻蚀率和选择性,但实际上,要求经常清洗以消除枪内的聚合物,因此重复性差。
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