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ji guang guang ke she bei
Author(s): 
Pages: 295
Year: Issue:  4
Journal: Optoelectronic Technology

Keyword:  光点尺寸光刻设备掩模板光栅扫描;
Abstract: <正> 瑞士 Lasarray 公司生产的 DWL2.0是4束、20MHz 激光光刻系统。最小光点尺寸<500nm(在标准线/掩模板的自由度为10nm时),在晶片自由度(DOF)为1700nm 时光点尺寸<800nm。最大基片尺寸为200×200mm,即大型平板应用的选择段为800×800mm。已
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